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The influence of Ga$^+$-irradiation on the transport properties of mesoscopic conducting thin films

机译:Ga $ ^ + $ - 辐照对镧系元素运移特性的影响   介观导电薄膜

摘要

We studied the influence of 30keV Ga$^+$-ions -- commonly used in focused ionbeam (FIB) devices -- on the transport properties of thin crystalline graphiteflake, La$_{0.7}$Ca$_{0.3}$MnO$_3$ and Co thin films. The changes of theelectrical resistance were measured in-situ during irradiation and also thetemperature and magnetic field dependence before and after irradiation. Ourresults show that the transport properties of these materials strongly changeat Ga$^+$ fluences much below those used for patterning and ion beam induceddeposition (IBID), limiting seriously the use of FIB when the intrinsicproperties of the materials of interest are of importance. We present a methodthat can be used to protect the sample as well as to produce selectivelyirradiation-induced changes.
机译:我们研究了30keV Ga $ ^ + $离子(通常用于聚焦离子束(FIB)器件)对薄晶体石墨薄片La $ _ {0.7} $ Ca $ _ {0.3} $ MnO的传输性能的影响。 $ _3 $和Co薄膜。在辐照期间就地测量电阻的变化,并且还测量辐照前后的温度和磁场依赖性。我们的结果表明,这些材料的传输特性在Ga $ ^ + $的注量下发生了很大的变化,远低于用于图案化和离子束诱导沉积(IBID)的那些,从而在重要的材料固有特性很重要时严重限制了FIB的使用。我们提出了一种可用于保护样品以及产生选择性辐照引起的变化的方法。

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